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Quantitative pattern collapse metrology for 193nm immersion lithography

dc.contributor.authorWinroth, Gustaf
dc.contributor.authorGronheid, Roel
dc.contributor.authorLin, Chua
dc.contributor.authorNeishi, Katsumi
dc.contributor.authorHarukawa, Ryota
dc.contributor.authorMarcuccilli, Gino
dc.date.accessioned2021-10-19T21:51:06Z
dc.date.available2021-10-19T21:51:06Z
dc.date.issued2011
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20153
dc.sourceIIOimport
dc.titleQuantitative pattern collapse metrology for 193nm immersion lithography
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage233
dc.source.endpage238
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue2
dc.source.volume24
imec.availabilityPublished - open access


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