dc.contributor.author | Zhao, Larry | |
dc.contributor.author | Lofrano, Melina | |
dc.contributor.author | Croes, Kristof | |
dc.contributor.author | Van Besien, Els | |
dc.contributor.author | Tokei, Zsolt | |
dc.contributor.author | Wilson, Chris | |
dc.contributor.author | Degraeve, Robin | |
dc.contributor.author | Kauerauf, Thomas | |
dc.contributor.author | Beyer, Gerald | |
dc.contributor.author | Claeys, Cor | |
dc.date.accessioned | 2021-10-19T22:26:32Z | |
dc.date.available | 2021-10-19T22:26:32Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 0040-6090 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20221 | |
dc.source | IIOimport | |
dc.title | Evaluations of intrinsic time dependent dielectric breakdown of dielectric copper diffusion barriers | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lofrano, Melina | |
dc.contributor.imecauthor | Croes, Kristof | |
dc.contributor.imecauthor | Van Besien, Els | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.imecauthor | Wilson, Chris | |
dc.contributor.imecauthor | Degraeve, Robin | |
dc.contributor.imecauthor | Beyer, Gerald | |
dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
dc.contributor.orcidimec | Van Besien, Els::0000-0002-5174-2229 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 662 | |
dc.source.endpage | 666 | |
dc.source.journal | Thin Solid Films | |
dc.source.issue | 1 | |
dc.source.volume | 520 | |
imec.availability | Published - imec | |