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Role of copper in time dependent dielectric breakdown of porous organo-silicate glass low-k materials

dc.contributor.authorZhao, Larry
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorCroes, Kristof
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBarbarin, Yohan
dc.contributor.authorWilson, Chris
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBeyer, Gerald
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-19T22:27:07Z
dc.date.available2021-10-19T22:27:07Z
dc.date.issued2011
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20222
dc.sourceIIOimport
dc.titleRole of copper in time dependent dielectric breakdown of porous organo-silicate glass low-k materials
dc.typeJournal article
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage222110
dc.source.journalApplied Physics Letters
dc.source.issue22
dc.source.volume99
imec.availabilityPublished - open access


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