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Study of metal barrier deposition-induced damage to porous low-k materials

dc.contributor.authorZhao, Larry
dc.contributor.authorVolders, Henny
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorTokei, Zsolt
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorWilson, Chris
dc.contributor.authorVan Besien, Els
dc.contributor.authorBeyer, Gerald
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-19T22:28:14Z
dc.date.available2021-10-19T22:28:14Z
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20224
dc.sourceIIOimport
dc.titleStudy of metal barrier deposition-induced damage to porous low-k materials
dc.typeJournal article
dc.contributor.imecauthorVolders, Henny
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage3030
dc.source.endpage3034
dc.source.journalMicroelectronic Engineering
dc.source.issue9
dc.source.volume88
imec.availabilityPublished - open access


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