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Compositional depth profiling of TaCN thin films

dc.contributor.authorAdelmann, Christoph
dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorBrijs, Bert
dc.contributor.authorMunnik, Frans
dc.contributor.authorBurgess, Simon
dc.contributor.authorWitters, Thomas
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorKittl, Jorge
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-20T10:00:50Z
dc.date.available2021-10-20T10:00:50Z
dc.date.issued2012
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20254
dc.sourceIIOimport
dc.titleCompositional depth profiling of TaCN thin films
dc.typeJournal article
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage41510
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.issue4
dc.source.volume30
dc.identifier.urlhttp://dx.doi.org/10.1116/1.4726261
imec.availabilityPublished - imec


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