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Submicron processing of InAs based quantum wells: a new, highly selective wet etchant for AlSb

dc.contributor.authorMorpurgo, A. F.
dc.contributor.authorvan Wees, B. J.
dc.contributor.authorKlapwijk, T. M.
dc.contributor.authorBorghs, Gustaaf
dc.date.accessioned2021-09-30T09:19:32Z
dc.date.available2021-09-30T09:19:32Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2040
dc.sourceIIOimport
dc.titleSubmicron processing of InAs based quantum wells: a new, highly selective wet etchant for AlSb
dc.typeJournal article
dc.contributor.imecauthorBorghs, Gustaaf
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1435
dc.source.endpage1437
dc.source.journalAppl. Phys. Lett.
dc.source.issue11
dc.source.volume70
imec.availabilityPublished - open access


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