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Light point defect generation during photoresist spin coating

dc.contributor.authorMouche, Laurent
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-30T09:19:54Z
dc.date.available2021-09-30T09:19:54Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2045
dc.sourceIIOimport
dc.titleLight point defect generation during photoresist spin coating
dc.typeJournal article
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage3608
dc.source.endpage3613
dc.source.journalJ. Electrochem. Soc.
dc.source.issue10
dc.source.volume144
imec.availabilityPublished - open access


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