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Impact of O2-based plasma strip chemistries on the electrochemical behavior of TiN electrodes for biomedical applications

dc.contributor.authorCollaert, Nadine
dc.contributor.authorMannaert, Geert
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorGoossens, Danny
dc.contributor.authorDemand, Marc
dc.contributor.authorEberle, Wolfgang
dc.date.accessioned2021-10-20T10:22:13Z
dc.date.available2021-10-20T10:22:13Z
dc.date.issued2012-11
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20490
dc.sourceIIOimport
dc.titleImpact of O2-based plasma strip chemistries on the electrochemical behavior of TiN electrodes for biomedical applications
dc.typeJournal article
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorEberle, Wolfgang
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecEberle, Wolfgang::0000-0002-6115-9811
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage6
dc.source.endpage10
dc.source.journalMicroelectronic Engineering
dc.source.volume99
imec.availabilityPublished - open access


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