A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers
dc.contributor.author | Goethals, Frederik | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Detavernier, Christophe | |
dc.contributor.author | Van Der Voort, Pascal | |
dc.contributor.author | Van Driessche, Isabel | |
dc.date.accessioned | 2021-10-20T11:13:22Z | |
dc.date.available | 2021-10-20T11:13:22Z | |
dc.date.issued | 2012 | |
dc.identifier.issn | 1359-7345 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20727 | |
dc.source | IIOimport | |
dc.title | A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers | |
dc.type | Journal article | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 2797 | |
dc.source.endpage | 2799 | |
dc.source.journal | Chemical Communications | |
dc.source.issue | 22 | |
dc.source.volume | 48 | |
imec.availability | Published - imec |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |