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A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers

dc.contributor.authorGoethals, Frederik
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorCiofi, Ivan
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorVan Der Voort, Pascal
dc.contributor.authorVan Driessche, Isabel
dc.date.accessioned2021-10-20T11:13:22Z
dc.date.available2021-10-20T11:13:22Z
dc.date.issued2012
dc.identifier.issn1359-7345
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20727
dc.sourceIIOimport
dc.titleA new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers
dc.typeJournal article
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.source.peerreviewyes
dc.source.beginpage2797
dc.source.endpage2799
dc.source.journalChemical Communications
dc.source.issue22
dc.source.volume48
imec.availabilityPublished - imec


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