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Selective area growth of InP on on-axis Si(001) substrates with low antiphase boundary formation

dc.contributor.authorLoo, Roger
dc.contributor.authorWang, Gang
dc.contributor.authorOrzali, Tommaso
dc.contributor.authorWaldron, Niamh
dc.contributor.authorMerckling, Clement
dc.contributor.authorLeys, Maarten
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorEyben, Pierre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-20T12:58:37Z
dc.date.available2021-10-20T12:58:37Z
dc.date.issued2012
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21060
dc.sourceIIOimport
dc.titleSelective area growth of InP on on-axis Si(001) substrates with low antiphase boundary formation
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.identifier.doi10.1149/2.051203jes
dc.source.peerreviewyes
dc.source.beginpageH260
dc.source.endpageH265
dc.source.journalJournal of the Electrochemical Society
dc.source.issue3
dc.source.volume159
imec.availabilityPublished - imec


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