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Temperature and RF current sensor wafers for plasma etching

dc.contributor.authorMilenin, Alexey
dc.contributor.authorDemand, Marc
dc.contributor.authorBoullart, Werner
dc.contributor.authorArleo, Paul
dc.date.accessioned2021-10-20T13:31:01Z
dc.date.available2021-10-20T13:31:01Z
dc.date.issued2012
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21145
dc.sourceIIOimport
dc.titleTemperature and RF current sensor wafers for plasma etching
dc.typeJournal article
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageH5
dc.source.endpageH10
dc.source.journalJournal of the Electrochemical Society
dc.source.issue1
dc.source.volume159
imec.availabilityPublished - open access


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