dc.contributor.author | Mueller, Stefan | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Singh, A. | |
dc.contributor.author | Van Elshocht, Sven | |
dc.contributor.author | Schroeder, Uwe | |
dc.contributor.author | Mikolajick, T. | |
dc.date.accessioned | 2021-10-20T13:41:50Z | |
dc.date.available | 2021-10-20T13:41:50Z | |
dc.date.issued | 2012-10 | |
dc.identifier.issn | 2162-8769 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21172 | |
dc.source | IIOimport | |
dc.title | Ferroelectricity in Gd:HfO2 thin films | |
dc.type | Journal article | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Van Elshocht, Sven | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Van Elshocht, Sven::0000-0002-6512-1909 | |
dc.source.peerreview | yes | |
dc.source.beginpage | N123 | |
dc.source.endpage | N126 | |
dc.source.journal | ECS Journal of Solid State Science and Technology | |
dc.source.issue | 6 | |
dc.source.volume | 1 | |
dc.identifier.url | http://jss.ecsdl.org/content/1/6/N123.abstract?sid=2835b0bd-b333-4972-aaf7-63db7cb16dd1 | |
imec.availability | Published - imec | |