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dc.contributor.authorMueller, Stefan
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSingh, A.
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorSchroeder, Uwe
dc.contributor.authorMikolajick, T.
dc.date.accessioned2021-10-20T13:41:50Z
dc.date.available2021-10-20T13:41:50Z
dc.date.issued2012-10
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21172
dc.sourceIIOimport
dc.titleFerroelectricity in Gd:HfO2 thin films
dc.typeJournal article
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpageN123
dc.source.endpageN126
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue6
dc.source.volume1
dc.identifier.urlhttp://jss.ecsdl.org/content/1/6/N123.abstract?sid=2835b0bd-b333-4972-aaf7-63db7cb16dd1
imec.availabilityPublished - imec


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