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Impact of precursor chemistry on atomic layer deposition of lutetium aluminates

dc.contributor.authorNyns, Laura
dc.contributor.authorShi, Xiaoping
dc.contributor.authorTielens, Hilde
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDate, Lucien
dc.contributor.authorSchreutelkamp, Rob
dc.date.accessioned2021-10-20T13:58:46Z
dc.date.available2021-10-20T13:58:46Z
dc.date.issued2012
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21214
dc.sourceIIOimport
dc.titleImpact of precursor chemistry on atomic layer deposition of lutetium aluminates
dc.typeJournal article
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDate, Lucien
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage01A120
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.issue1
dc.source.volume30
imec.availabilityPublished - open access


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