On the diffusion and activation of n-type dopants in Ge
dc.contributor.author | Vanhellemont, Jan | |
dc.contributor.author | Simoen, Eddy | |
dc.date.accessioned | 2021-10-20T18:05:50Z | |
dc.date.available | 2021-10-20T18:05:50Z | |
dc.date.issued | 2012 | |
dc.identifier.issn | 1369-8001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21749 | |
dc.source | IIOimport | |
dc.title | On the diffusion and activation of n-type dopants in Ge | |
dc.type | Journal article | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 642 | |
dc.source.endpage | 655 | |
dc.source.journal | Materials Science in Semiconductor Processing | |
dc.source.volume | 15 | |
imec.availability | Published - open access |