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dc.contributor.authorVanhellemont, Jan
dc.contributor.authorSimoen, Eddy
dc.date.accessioned2021-10-20T18:05:50Z
dc.date.available2021-10-20T18:05:50Z
dc.date.issued2012
dc.identifier.issn1369-8001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21749
dc.sourceIIOimport
dc.titleOn the diffusion and activation of n-type dopants in Ge
dc.typeJournal article
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage642
dc.source.endpage655
dc.source.journalMaterials Science in Semiconductor Processing
dc.source.volume15
imec.availabilityPublished - open access


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