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dc.contributor.authorVermang, Bart
dc.contributor.authorGoverde, Hans
dc.contributor.authorTous, Loic
dc.contributor.authorLorenz, Anne
dc.contributor.authorChoulat, Patrick
dc.contributor.authorHorzel, Jörg
dc.contributor.authorJohn, Joachim
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-10-20T18:27:28Z
dc.date.available2021-10-20T18:27:28Z
dc.date.issued2012
dc.identifier.issn1062-7995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21789
dc.sourceIIOimport
dc.titleApproach for Al2O3 rear surface passivation of industrial p-type Si PERC above 19%
dc.typeJournal article
dc.contributor.imecauthorVermang, Bart
dc.contributor.imecauthorTous, Loic
dc.contributor.imecauthorChoulat, Patrick
dc.contributor.imecauthorJohn, Joachim
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimecTous, Loic::0000-0001-9928-7774
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage269
dc.source.endpage273
dc.source.journalProgress in Photovoltaics Research and Applications
dc.source.issue20
dc.source.volume2012
imec.availabilityPublished - imec


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