dc.contributor.author | Vermang, Bart | |
dc.contributor.author | Goverde, Hans | |
dc.contributor.author | Tous, Loic | |
dc.contributor.author | Lorenz, Anne | |
dc.contributor.author | Choulat, Patrick | |
dc.contributor.author | Horzel, Jörg | |
dc.contributor.author | John, Joachim | |
dc.contributor.author | Poortmans, Jef | |
dc.contributor.author | Mertens, Robert | |
dc.date.accessioned | 2021-10-20T18:27:28Z | |
dc.date.available | 2021-10-20T18:27:28Z | |
dc.date.issued | 2012 | |
dc.identifier.issn | 1062-7995 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21789 | |
dc.source | IIOimport | |
dc.title | Approach for Al2O3 rear surface passivation of industrial p-type Si PERC above 19% | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vermang, Bart | |
dc.contributor.imecauthor | Tous, Loic | |
dc.contributor.imecauthor | Choulat, Patrick | |
dc.contributor.imecauthor | John, Joachim | |
dc.contributor.imecauthor | Poortmans, Jef | |
dc.contributor.imecauthor | Mertens, Robert | |
dc.contributor.orcidimec | Vermang, Bart::0000-0003-2669-2087 | |
dc.contributor.orcidimec | Tous, Loic::0000-0001-9928-7774 | |
dc.contributor.orcidimec | Poortmans, Jef::0000-0003-2077-2545 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 269 | |
dc.source.endpage | 273 | |
dc.source.journal | Progress in Photovoltaics Research and Applications | |
dc.source.issue | 20 | |
dc.source.volume | 2012 | |
imec.availability | Published - imec | |