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dc.contributor.authorBaylav, Burak
dc.contributor.authorMaloney, Chris
dc.contributor.authorLevinson, Zac
dc.contributor.authorBekaert, Joost
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorSmith, Bruce W.
dc.date.accessioned2021-10-21T06:45:13Z
dc.date.available2021-10-21T06:45:13Z
dc.date.issued2013
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22027
dc.sourceIIOimport
dc.titleThe impact of pupil plane filtering on mask roughness transfer
dc.typeJournal article
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage06F801
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue6
dc.source.volume31
dc.identifier.urlhttp://scitation.aip.org/content/avs/journal/jvstb/31/6/10.1116/1.4825102
imec.availabilityPublished - open access
imec.internalnotesPaper from the 57th Int. Conf.Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN; May 2013; Nashville, TN, USA


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