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A thermally stable and high-performance 90nm Al2O3\Cu-based 1T1R CBRAM cell

dc.contributor.authorBelmonte, Attilio
dc.contributor.authorKim, Woosik
dc.contributor.authorChan, BT
dc.contributor.authorHeylen, Nancy
dc.contributor.authorFantini, Andrea
dc.contributor.authorHoussa, Michel
dc.contributor.authorJurczak, Gosia
dc.contributor.authorGoux, Ludovic
dc.date.accessioned2021-10-21T06:45:41Z
dc.date.available2021-10-21T06:45:41Z
dc.date.issued2013
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22033
dc.sourceIIOimport
dc.titleA thermally stable and high-performance 90nm Al2O3\Cu-based 1T1R CBRAM cell
dc.typeJournal article
dc.contributor.imecauthorBelmonte, Attilio
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.source.peerreviewyes
dc.source.beginpage3690
dc.source.endpage3695
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue11
dc.source.volume60
dc.identifier.urlhttp://www.ieeeexplore.us/xpl/articleDetails.jsp?tp=&arnumber=6612703&queryText%3DA+thermally+stable+and+high-performance+90nm+A
imec.availabilityPublished - imec


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