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Hydrogen behavior in amorphous Si/Ge nano-structures after annealing

dc.contributor.authorFrigeri, C.
dc.contributor.authorSerenyi, M.
dc.contributor.authorKhanh, N.Q.
dc.contributor.authorCsik, A.
dc.contributor.authorNasi, L.
dc.contributor.authorErdelyi, Z.
dc.contributor.authorBeke, D.L.
dc.contributor.authorBoyen, Hans-Gerd
dc.date.accessioned2021-10-21T07:44:09Z
dc.date.available2021-10-21T07:44:09Z
dc.date.issued2013
dc.identifier.issn0169-4332
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22371
dc.sourceIIOimport
dc.titleHydrogen behavior in amorphous Si/Ge nano-structures after annealing
dc.typeJournal article
dc.contributor.imecauthorBoyen, Hans-Gerd
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage30
dc.source.endpage34
dc.source.journalApplied Surface Science
dc.source.volume267
imec.availabilityPublished - open access


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