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Atomic layer deposition of TiO2 on surface modified nanoporous low-k films

dc.contributor.authorLevrau, Elisabeth
dc.contributor.authorDevloo-Casier, Kilain
dc.contributor.authorDendooven, Jolien
dc.contributor.authorLudwig, Karl
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorDetavernier, Christophe
dc.date.accessioned2021-10-21T09:16:29Z
dc.date.available2021-10-21T09:16:29Z
dc.date.issued2013
dc.identifier.issn0743-7463
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22675
dc.sourceIIOimport
dc.titleAtomic layer deposition of TiO2 on surface modified nanoporous low-k films
dc.typeJournal article
dc.contributor.imecauthorLevrau, Elisabeth
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage12284
dc.source.endpage12289
dc.source.journalLangmuir
dc.source.issue39
dc.source.volume29
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/la4027738
imec.availabilityPublished - open access


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