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Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield

dc.contributor.authorVanhellemont, Jan
dc.contributor.authorMilita, S.
dc.contributor.authorServidori, M.
dc.contributor.authorHiggs, V.
dc.contributor.authorKissinger, G.
dc.contributor.authorGramenova, Emilia
dc.contributor.authorSimoen, Eddy
dc.contributor.authorJansen, Philippe
dc.date.accessioned2021-09-30T09:58:33Z
dc.date.available2021-09-30T09:58:33Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2271
dc.sourceIIOimport
dc.titleNon-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield
dc.typeJournal article
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1425
dc.source.endpage1433
dc.source.journalJournal de Physique III
dc.source.volume7
imec.availabilityPublished - open access


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