Dry development for 0.25 μm top surface imaging
| dc.contributor.author | Vertommen, Johan | |
| dc.contributor.author | Goethals, Mieke | |
| dc.date.accessioned | 2021-09-30T10:03:53Z | |
| dc.date.available | 2021-09-30T10:03:53Z | |
| dc.date.issued | 1997 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2293 | |
| dc.source | IIOimport | |
| dc.title | Dry development for 0.25 μm top surface imaging | |
| dc.type | Journal article | |
| dc.date.embargo | 9999-12-31 | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 2461 | |
| dc.source.endpage | 2467 | |
| dc.source.journal | Journal of the Electrochemical Society | |
| dc.source.issue | 7 | |
| dc.source.volume | 144 | |
| imec.availability | Published - imec |