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Stability of Si epoxide defects in Si nanowires: a mixed reactive force field/DFT study

dc.contributor.authorSchoeters, Bob
dc.contributor.authorNeyts, Erik
dc.contributor.authorKhalilov, Umedjon
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorPartoens, Bob
dc.date.accessioned2021-10-21T11:46:36Z
dc.date.available2021-10-21T11:46:36Z
dc.date.issued2013
dc.identifier.issn1463-9076
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23045
dc.sourceIIOimport
dc.titleStability of Si epoxide defects in Si nanowires: a mixed reactive force field/DFT study
dc.typeJournal article
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.source.peerreviewyes
dc.source.beginpage15091
dc.source.endpage15097
dc.source.journalPhysical Chemistry Chemical Physics
dc.source.issue36
dc.source.volume15
dc.identifier.urlhttp://pubs.rsc.org/en/content/articlelanding/2013/cp/c3cp51621k#!divAbstract
imec.availabilityPublished - imec


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