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Initial growth stages of heavily boron-doped HFCVD diamond for electrical probe application

dc.contributor.authorSimon, Daniel
dc.contributor.authorTsigkourakos, Menelaos
dc.contributor.authorHantschel, Thomas
dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-21T12:09:05Z
dc.date.available2021-10-21T12:09:05Z
dc.date.issued2013
dc.identifier.issn0031-8965
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23094
dc.sourceIIOimport
dc.titleInitial growth stages of heavily boron-doped HFCVD diamond for electrical probe application
dc.typeJournal article
dc.contributor.imecauthorHantschel, Thomas
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHantschel, Thomas::0000-0001-9476-4084
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewyes
dc.source.beginpage2002
dc.source.endpage2007
dc.source.journalPhysica Status Solidi A
dc.source.issue10
dc.source.volume210
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/pssa.201300041/abstract
imec.availabilityPublished - imec


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