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Wet chemical etching of InP for cleaning applications: II. Oxide removal

dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorCuypers, Daniel
dc.contributor.authorArnauts, Sophia
dc.contributor.authorMoussa, Alain
dc.contributor.authorRodriguez, Leonard
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-21T13:23:16Z
dc.date.available2021-10-21T13:23:16Z
dc.date.issued2013
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23248
dc.sourceIIOimport
dc.titleWet chemical etching of InP for cleaning applications: II. Oxide removal
dc.typeJournal article
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageP190
dc.source.endpageP194
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue4
dc.source.volume2
dc.identifier.urlhttp://jss.ecsdl.org/content/2/4/P190.abstract
imec.availabilityPublished - open access


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