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Chemisorption of ALD precursors in and on porous low-k films

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSwerts, Johan
dc.contributor.authorFarrell, Leo
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorTielens, Hilde
dc.contributor.authorVan Besien, Els
dc.contributor.authorWitters, Thomas
dc.contributor.authorNyns, Laura
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-21T14:01:40Z
dc.date.available2021-10-21T14:01:40Z
dc.date.issued2013
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23324
dc.sourceIIOimport
dc.titleChemisorption of ALD precursors in and on porous low-k films
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage81
dc.source.endpage84
dc.source.journalMicroelectronic Engineering
dc.source.volume106
imec.availabilityPublished - open access


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