Show simple item record

A simulation study on process sensitivity of a line tunnel field-effect transistor

dc.contributor.authorWalke, Amey
dc.contributor.authorVandenberghe, William
dc.contributor.authorKao, Frank
dc.contributor.authorVandooren, Anne
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-21T14:22:49Z
dc.date.available2021-10-21T14:22:49Z
dc.date.issued2013
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23367
dc.sourceIIOimport
dc.titleA simulation study on process sensitivity of a line tunnel field-effect transistor
dc.typeJournal article
dc.contributor.imecauthorWalke, Amey
dc.contributor.imecauthorKao, Frank
dc.contributor.imecauthorVandooren, Anne
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecVandooren, Anne::0000-0002-2412-0176
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1019
dc.source.endpage1027
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue3
dc.source.volume60
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
26564.pdf
Size:
1.434Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record