Show simple item record

Precuring implant photoresists for shrink and patterning control

dc.contributor.authorWinroth, Gustaf
dc.contributor.authorRosseel, Erik
dc.contributor.authorDelvaux, Christie
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorErcken, Monique
dc.date.accessioned2021-10-21T14:38:28Z
dc.date.available2021-10-21T14:38:28Z
dc.date.issued2013
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23397
dc.sourceIIOimport
dc.titlePrecuring implant photoresists for shrink and patterning control
dc.typeJournal article
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorErcken, Monique
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage41303
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue4
dc.source.volume12
dc.identifier.urlhttp://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1735280
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
27106.pdf
Size:
2.349Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record