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Correlation between field dependent electrical conduction and dielectric breakdown in a SiOCH based low-k (k=2.0) dielectric

dc.contributor.authorWu, Chen
dc.contributor.authorLi, Yunlong
dc.contributor.authorBarbarin, Yohan
dc.contributor.authorCiofi, Ivan
dc.contributor.authorCroes, Kristof
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-21T14:42:22Z
dc.date.available2021-10-21T14:42:22Z
dc.date.issued2013
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23404
dc.sourceIIOimport
dc.titleCorrelation between field dependent electrical conduction and dielectric breakdown in a SiOCH based low-k (k=2.0) dielectric
dc.typeJournal article
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorLi, Yunlong
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.source.peerreviewyes
dc.source.beginpage32904
dc.source.journalApplied Physics Letters
dc.source.issue3
dc.source.volume103
dc.identifier.urlhttp://apl.aip.org/resource/1/applab/v103/i3/p032904_s1
imec.availabilityPublished - imec


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