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Optical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD

dc.contributor.authorAbdulraheem, Yaser
dc.contributor.authorGordon, Ivan
dc.contributor.authorBearda, Twan
dc.contributor.authorMeddeb, Hosny
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-22T00:43:00Z
dc.date.available2021-10-22T00:43:00Z
dc.date.issued2014
dc.identifier.issn2158-3226
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23462
dc.sourceIIOimport
dc.titleOptical bandgap of ultra-thin amorphous silicon films deposited on crystalline silicon by PECVD
dc.typeJournal article
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage57122
dc.source.journalAIP Advances
dc.source.issue5
dc.source.volume4
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/adva/4/5/10.1063/1.4879807
imec.availabilityPublished - imec


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