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Leaching and drying marks on photoresist-coated substrates

dc.contributor.authorBelmiloud, Naser
dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorMertens, Paul
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-22T00:45:39Z
dc.date.available2021-10-22T00:45:39Z
dc.date.issued2014
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23532
dc.sourceIIOimport
dc.titleLeaching and drying marks on photoresist-coated substrates
dc.typeJournal article
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.source.peerreviewyes
dc.source.beginpage131
dc.source.endpage135
dc.source.journalMicroelectronic Engineering
dc.source.volume114
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931713003432
imec.availabilityPublished - imec


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