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Progresses and challenges of EUV lithography materials

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorTao, Zheng
dc.contributor.authorFoubert, Philippe
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-22T01:09:16Z
dc.date.available2021-10-22T01:09:16Z
dc.date.issued2014
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23723
dc.sourceIIOimport
dc.titleProgresses and challenges of EUV lithography materials
dc.typeJournal article
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorTao, Zheng
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage601
dc.source.endpage610
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue5
dc.source.volume27
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/27/5/27_601/_article
imec.availabilityPublished - open access


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