Front end of the line process
dc.contributor.author | Han, Jeong Hwan | |
dc.contributor.author | Cho, Moon Ju | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Park, Tae Joo | |
dc.contributor.author | Hwang, cheol seong | |
dc.date.accessioned | 2021-10-22T01:50:03Z | |
dc.date.available | 2021-10-22T01:50:03Z | |
dc.date.issued | 2014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23902 | |
dc.source | IIOimport | |
dc.title | Front end of the line process | |
dc.type | Book chapter | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.source.peerreview | no | |
dc.source.beginpage | 175 | |
dc.source.book | Atomic Layer Deposition for Modern Semiconductor Devices | |
dc.source.endpage | 208 | |
imec.availability | Published - imec | |
imec.internalnotes | Chapter 7 ISBN 978-1-4614-8053-2 |
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