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Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth

dc.contributor.authorKarim, Marwa
dc.contributor.authorMartini, Roberto
dc.contributor.authorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.authorDepauw, Valerie
dc.contributor.authorVan Nieuwenhuysen, Kris
dc.contributor.authorRamadan, Wegdan
dc.contributor.authorGordon, Ivan
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-22T02:29:42Z
dc.date.available2021-10-22T02:29:42Z
dc.date.issued2014
dc.identifier.issn1931-7573
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24035
dc.sourceIIOimport
dc.titleTuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth
dc.typeJournal article
dc.contributor.imecauthorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecSivaramakrishnan Radhakrishnan, Hariharsudan::0000-0003-1963-273X
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage348
dc.source.journalNanoscale Research Letters
dc.source.issueJuly
dc.source.volume9
dc.identifier.urlhttp://rd.springer.com/article/10.1186/1556-276X-9-348
imec.availabilityPublished - imec


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