dc.contributor.author | O'Sullivan, Barry | |
dc.contributor.author | Bearda, Twan | |
dc.contributor.author | Nadupalli, Shankari | |
dc.contributor.author | Labie, Riet | |
dc.contributor.author | Baert, Kris | |
dc.contributor.author | Gordon, Ivan | |
dc.contributor.author | Poortmans, Jef | |
dc.date.accessioned | 2021-10-22T04:30:48Z | |
dc.date.available | 2021-10-22T04:30:48Z | |
dc.date.issued | 2014 | |
dc.identifier.issn | 2156-3381 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/24353 | |
dc.source | IIOimport | |
dc.title | Process-induced degradation of SiO2 and a-Si:H passivation layers for photovoltaic applications | |
dc.type | Journal article | |
dc.contributor.imecauthor | O'Sullivan, Barry | |
dc.contributor.imecauthor | Labie, Riet | |
dc.contributor.imecauthor | Gordon, Ivan | |
dc.contributor.imecauthor | Poortmans, Jef | |
dc.contributor.orcidimec | O'Sullivan, Barry::0000-0002-9036-8241 | |
dc.contributor.orcidimec | Labie, Riet::0000-0002-1401-1291 | |
dc.contributor.orcidimec | Gordon, Ivan::0000-0002-0713-8403 | |
dc.contributor.orcidimec | Poortmans, Jef::0000-0003-2077-2545 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 1197 | |
dc.source.endpage | 1203 | |
dc.source.journal | IEEE Journal of Photovoltaics | |
dc.source.issue | 5 | |
dc.source.volume | 4 | |
dc.identifier.url | http://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6834759&queryText%3DProcess+induced+degradation+of+SiO2+and+a-Si% | |
imec.availability | Published - open access | |