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Influence of hydrogen and hydrogen/methane plasmas on AlN thin films

dc.contributor.authorPobedinskas, Paulius
dc.contributor.authorDegutis, Giedrius
dc.contributor.authorDexters, Wim
dc.contributor.authorHardy, An
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorHaenen, Ken
dc.date.accessioned2021-10-22T04:47:19Z
dc.date.available2021-10-22T04:47:19Z
dc.date.issued2014
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24391
dc.sourceIIOimport
dc.titleInfluence of hydrogen and hydrogen/methane plasmas on AlN thin films
dc.typeJournal article
dc.contributor.imecauthorPobedinskas, Paulius
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.imecauthorHaenen, Ken
dc.contributor.orcidimecPobedinskas, Paulius::0000-0001-8136-5172
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.contributor.orcidimecHaenen, Ken::0000-0001-6711-7367
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage81917
dc.source.journalApplied Physics Letters
dc.source.issue8
dc.source.volume104
dc.identifier.urlhttp://scitation.aip.org/content/aip/journal/apl/104/8/10.1063/1.4867022
imec.availabilityPublished - open access


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