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dc.contributor.authorTang, Baojun
dc.contributor.authorZhang, Weidong
dc.contributor.authorBreuil, Laurent
dc.contributor.authorRobinson, Colin
dc.contributor.authorWang, Yunqi
dc.contributor.authorToledano Luque, Maria
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorZhang, Jianfu
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2021-10-22T06:24:22Z
dc.date.available2021-10-22T06:24:22Z
dc.date.issued2014
dc.identifier.issn0026-2714
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24595
dc.sourceIIOimport
dc.titleOptimization of inter-gate-dielectrics in hybrid float gate devices to reduce window instability during memory operations
dc.typeJournal article
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewyes
dc.source.beginpage2258
dc.source.endpage2261
dc.source.journalMicroelectronics Reliability
dc.source.issue9_10
dc.source.volume54
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0026271414002832#
imec.availabilityPublished - imec
imec.internalnotesSpecial issue: 25th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis - ESREF; Berlin


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