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Characterization of individual traps in high-k oxides

dc.contributor.authorToledano Luque, Maria
dc.contributor.authorKaczer, Ben
dc.date.accessioned2021-10-22T06:34:53Z
dc.date.available2021-10-22T06:34:53Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24617
dc.sourceIIOimport
dc.titleCharacterization of individual traps in high-k oxides
dc.typeBook chapter
dc.contributor.imecauthorKaczer, Ben
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.source.peerreviewno
dc.source.beginpage597
dc.source.bookBias Temperature Instability for Devices and Circuits
dc.source.endpage614
imec.availabilityPublished - imec
imec.internalnotesISBN: 978-1-4614-7908-6 (Print) 978-1-4614-7909-3 (Online)


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