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High throughput grating qualification of directed self-assembly patterns using optical metrology

dc.contributor.authorVan Look, Lieve
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorLee, Yu-tsung
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGronheid, Roel
dc.contributor.authorCao, Yi
dc.contributor.authorLin, Guanyang
dc.contributor.authorNealey, Paul F.
dc.date.accessioned2021-10-22T07:19:54Z
dc.date.available2021-10-22T07:19:54Z
dc.date.issued2014
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24709
dc.sourceIIOimport
dc.titleHigh throughput grating qualification of directed self-assembly patterns using optical metrology
dc.typeJournal article
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage175
dc.source.endpage179
dc.source.journalMicroelectronic Engineering
dc.source.volume123
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931714003414
imec.availabilityPublished - open access


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