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dc.contributor.authorDe Ceuninck, Ward
dc.contributor.authorD'Haeger, V.
dc.contributor.authorVan Olmen, Jan
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorMaex, Karen
dc.contributor.authorDe Schepper, Luc
dc.contributor.authorDe Pauw, P.
dc.contributor.authorPergoot, A.
dc.date.accessioned2021-09-30T11:40:25Z
dc.date.available2021-09-30T11:40:25Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2485
dc.sourceIIOimport
dc.titleThe influence of addition elements on the early resistance changes observed during electromigration testing of Al metal lines
dc.typeJournal article
dc.contributor.imecauthorDe Ceuninck, Ward
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage87
dc.source.endpage98
dc.source.journalMicroelectronics Reliability
dc.source.issue1
dc.source.volume38
imec.availabilityPublished - open access


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