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Band alignment and effective work function of atomiclayer deposited VO2 and V2O5 films on SiO2 and Al2O3

dc.contributor.authorCerbu, Florin
dc.contributor.authorChou, H.S.
dc.contributor.authorRadu, Iuliana
dc.contributor.authorMartens, Koen
dc.contributor.authorPeter, Antony
dc.contributor.authorAfanasev, Valeri
dc.contributor.authorStesmans, Andre
dc.date.accessioned2021-10-22T18:38:06Z
dc.date.available2021-10-22T18:38:06Z
dc.date.issued2015
dc.identifier.issn1610-1634
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25046
dc.sourceIIOimport
dc.titleBand alignment and effective work function of atomiclayer deposited VO2 and V2O5 films on SiO2 and Al2O3
dc.typeJournal article
dc.contributor.imecauthorCerbu, Florin
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorMartens, Koen
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecMartens, Koen::0000-0001-7135-5536
dc.source.peerreviewyes
dc.source.beginpage238
dc.source.endpage241
dc.source.journalPhysica Status Solidi C
dc.source.issue1
dc.source.volume12
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/pssc.201400037/abstract
imec.availabilityPublished - imec


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