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Intrinsic tailing of LRS/HRS distributions in amorphous HfO and TaO based RRAM

dc.contributor.authorClima, Sergiu
dc.contributor.authorChen, Yangyin
dc.contributor.authorFantini, Andrea
dc.contributor.authorGoux, Ludovic
dc.contributor.authorDegraeve, Robin
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorJurczak, Gosia
dc.date.accessioned2021-10-22T18:43:16Z
dc.date.available2021-10-22T18:43:16Z
dc.date.issued2015
dc.identifier.issn0741-3106
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25089
dc.sourceIIOimport
dc.titleIntrinsic tailing of LRS/HRS distributions in amorphous HfO and TaO based RRAM
dc.typeJournal article
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorChen, Yangyin
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.source.peerreviewyes
dc.source.beginpage769
dc.source.endpage771
dc.source.journalIEEE Electron Device Letters
dc.source.issue8
dc.source.volume36
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=7131462
imec.availabilityPublished - imec


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