How to make lithography patterns print: the role of OPC and pattern layout
| dc.contributor.author | De Bisschop, Peter | |
| dc.date.accessioned | 2021-10-22T18:48:30Z | |
| dc.date.available | 2021-10-22T18:48:30Z | |
| dc.date.issued | 2015 | |
| dc.identifier.issn | 2192-8584 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/25126 | |
| dc.source | IIOimport | |
| dc.title | How to make lithography patterns print: the role of OPC and pattern layout | |
| dc.type | Journal article | |
| dc.contributor.imecauthor | De Bisschop, Peter | |
| dc.source.peerreview | yes | |
| dc.source.beginpage | 253 | |
| dc.source.endpage | 284 | |
| dc.source.journal | Advanced Optical Technologies | |
| dc.source.issue | 4 | |
| dc.source.volume | 4 | |
| dc.identifier.url | http://www.degruyter.com/view/j/aot.2015.4.issue-4/aot-2015-0023/aot-2015-0023.xml | |
| imec.availability | Published - imec |
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