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dc.contributor.authorEyben, Pierre
dc.contributor.authorBisiaux, Pierre
dc.contributor.authorSchulze, Andreas
dc.contributor.authorNazir, Aftab
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-22T19:12:33Z
dc.date.available2021-10-22T19:12:33Z
dc.date.issued2015
dc.identifier.issn0957-4484
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25259
dc.sourceIIOimport
dc.titleFast Fourier transform scanning spreading resistance microscopy: a novel technique to overcome the limitations of classical conductive AFM techniques
dc.typeJournal article
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorNazir, Aftab
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewyes
dc.source.beginpage5702
dc.source.journalNanotechnology
dc.source.issue35
dc.source.volume26
dc.identifier.urlhttp://iopscience.iop.org/article/10.1088/0957-4484/26/35/355702/pdf
imec.availabilityPublished - imec


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