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Study of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films

dc.contributor.authorGodavarthi, Srinivas
dc.contributor.authorWang, Cong
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorMatsumoto, Y.
dc.contributor.authorKoudriavtsev, I
dc.contributor.authorDutt, A.
dc.contributor.authorTielens, Hilde
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-22T19:26:20Z
dc.date.available2021-10-22T19:26:20Z
dc.date.issued2015
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25321
dc.sourceIIOimport
dc.titleStudy of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorTielens, Hilde
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewyes
dc.source.beginpage103
dc.source.endpage106
dc.source.journalThin Solid Films
dc.source.volume575
dc.identifier.urlhttp://dx.doi.org/10.1016/j.tsf.2014.10.033
imec.availabilityPublished - imec


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