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Role of O2 radicals on silicone plasma treatments for surface passivation of wafers bonded to glass

dc.contributor.authorGranata, Stefano
dc.contributor.authorMarchegiani, Alessio
dc.contributor.authorBearda, Twan
dc.contributor.authorTous, Loic
dc.contributor.authorCheyns, David
dc.contributor.authorAbdulraheem, Yaser
dc.contributor.authorGordon, Ivan
dc.contributor.authorSzlufcik, Jozef
dc.contributor.authorMertens, Robert
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-22T19:29:57Z
dc.date.available2021-10-22T19:29:57Z
dc.date.issued2015
dc.identifier.issn1862-6300
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25335
dc.sourceIIOimport
dc.titleRole of O2 radicals on silicone plasma treatments for surface passivation of wafers bonded to glass
dc.typeJournal article
dc.contributor.imecauthorTous, Loic
dc.contributor.imecauthorCheyns, David
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorSzlufcik, Jozef
dc.contributor.imecauthorMertens, Robert
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecTous, Loic::0000-0001-9928-7774
dc.contributor.orcidimecCheyns, David::0000-0002-1327-8752
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage1946
dc.source.endpage1953
dc.source.journalPhysica Status Solidi A
dc.source.issue9
dc.source.volume212
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/pssa.201431945/abstract
imec.availabilityPublished - imec


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