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Preface to the Focus Issue on Atomic Layer Etch and Clean

dc.contributor.authorHuffman, Craig
dc.contributor.authorHess, D.W.
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorSekine, M.
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-22T19:47:21Z
dc.date.available2021-10-22T19:47:21Z
dc.date.issued2015
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25403
dc.sourceIIOimport
dc.titlePreface to the Focus Issue on Atomic Layer Etch and Clean
dc.typeJournal article
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageY7
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue6
dc.source.volume4
dc.identifier.urlhttp://jss.ecsdl.org/content/4/6/Y7.full.pdf+html
imec.availabilityPublished - open access


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