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Nucleation behavior of III/V crystal selectively grown inside nano-trenches: the influence of trench width

dc.contributor.authorJiang, Sijia
dc.contributor.authorMerckling, Clement
dc.contributor.authorMoussa, Alain
dc.contributor.authorWaldron, Niamh
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCollaert, Nadine
dc.contributor.authorBarla, Kathy
dc.contributor.authorLanger, Robert
dc.contributor.authorThean, Aaron
dc.contributor.authorSeefeldt, Marc
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-22T19:56:28Z
dc.date.available2021-10-22T19:56:28Z
dc.date.issued2015
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25434
dc.sourceIIOimport
dc.titleNucleation behavior of III/V crystal selectively grown inside nano-trenches: the influence of trench width
dc.typeJournal article
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageN83
dc.source.endpageN87
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue7
dc.source.volume4
dc.identifier.urlhttp://jss.ecsdl.org/content/4/7/N83.abstract?etoc
imec.availabilityPublished - open access


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