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Ultra high amorphous silicon passivation quality of crystalline silicon surface using in-situ post-deposition treatments

dc.contributor.authorMeddeb, Hosny
dc.contributor.authorBearda, Twan
dc.contributor.authorDimassi, Wissem
dc.contributor.authorAbdulraheem, Yaser
dc.contributor.authorEzzaouia, Hatem
dc.contributor.authorGordon, Ivan
dc.contributor.authorSzlufcik, Jozef
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-22T21:00:52Z
dc.date.available2021-10-22T21:00:52Z
dc.date.issued2015
dc.identifier.issn1862-6254
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25632
dc.sourceIIOimport
dc.titleUltra high amorphous silicon passivation quality of crystalline silicon surface using in-situ post-deposition treatments
dc.typeJournal article
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorSzlufcik, Jozef
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage53
dc.source.endpage56
dc.source.journalPhysica Status Solidi. Rapid Research Letters
dc.source.issue1
dc.source.volume9
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/pssr.201409494/abstract
imec.availabilityPublished - open access


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