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Wet chemical treatment of boron doped emitters on n-type (1 0 0) c-Si prior to amorphous silicon passivation

dc.contributor.authorMeddeb, Hosny
dc.contributor.authorBearda, Twan
dc.contributor.authorRecaman Payo, Maria
dc.contributor.authorAbdelwahab, Ibrahim
dc.contributor.authorAbdulraheem, Yaser
dc.contributor.authorEzzaouia, H.
dc.contributor.authorGordon, Ivan
dc.contributor.authorSzlufcik, Jozef
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-22T21:01:15Z
dc.date.available2021-10-22T21:01:15Z
dc.date.issued2015
dc.identifier.issn0169-4332
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25633
dc.sourceIIOimport
dc.titleWet chemical treatment of boron doped emitters on n-type (1 0 0) c-Si prior to amorphous silicon passivation
dc.typeJournal article
dc.contributor.imecauthorRecaman Payo, Maria
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorSzlufcik, Jozef
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage140
dc.source.endpage145
dc.source.journalApplied Surface Science
dc.source.volume328
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0169433214026804
imec.availabilityPublished - imec


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