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Development and evaluation of photodefinable wafer level underfill

dc.contributor.authorMitsukura, Kazuyuki
dc.contributor.authorSaisyo, Ryouta
dc.contributor.authorMakino, Tatsuya
dc.contributor.authorHatakeyama, Keiichi
dc.contributor.authorMinegishi, Tomonori
dc.contributor.authorWang, Teng
dc.contributor.authorDaily, Robert
dc.contributor.authorDuval, Fabrice
dc.contributor.authorRebibis, Kenneth June
dc.contributor.authorMiller, Andy
dc.contributor.authorBeyne, Eric
dc.date.accessioned2021-10-22T21:08:47Z
dc.date.available2021-10-22T21:08:47Z
dc.date.issued2015
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25653
dc.sourceIIOimport
dc.titleDevelopment and evaluation of photodefinable wafer level underfill
dc.typeJournal article
dc.contributor.imecauthorDuval, Fabrice
dc.contributor.imecauthorRebibis, Kenneth June
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorBeyne, Eric
dc.contributor.orcidimecBeyne, Eric::0000-0002-3096-050X
dc.source.peerreviewyes
dc.source.beginpage229
dc.source.endpage232
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue2
dc.source.volume28
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/28/2/28_229/_article
imec.availabilityPublished - imec
imec.internalnotes31st International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Micro-lithography, Nano ...


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